화공학회 2003년 가을학술대회
Electrical and physical characteristics of MOCVD zirconium and hafnium silicate thin films using new combinations of precursors
화학공학회 가을 학술대회
Comparative study of ultra-thin HfSiO and HfSiO/SiO2 gate dielectrics grown by self-limiting surface reaction between Hf(NC2H5)4 and Si(OC4H9)4 precursor
Nano Korea 2007
A Novel Heterostructure System : Hierarchical W nanothorn Arrays on WO3 nanowhiskers
210th ECS Meeting
Growth and characterization of ZnO nanorod array using a low temperature method: Comparison of MOCVD with solution method
AVS 53rd International symposium & Exhibition
Controlled Growth and Characterization of ZnO nanorod array using a low temperature solution method