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Advances in Patterning Materials and Processes XXXIX
1970
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Perfluoroalkylated metallophthalocyanines as EUV resist candidates
Advances in Patterning Materials and Processes XXXVIII
Highly fluorinated alternating copolymers possessing high glass transition temperature and cross-linking capabilities under extreme UV radiation
Advances in Patterning Materials and Processes XXXVII
Molecular resists equipped with fluorinated aromatic units for electron-beam and extreme UV lithography
Advances in Patterning Materials and Processes XXXVI
Imaging behavior of highly fluorinated molecular resists under extreme UV radiation
Emerging Lithographic Technologies XII
The study of attenuated PSM structure for extreme ultraviolet lithography with minimized mask shadowing effect