Investigations of the Pad Trajectory Effect on the Asymmetric Profile and Arc-Shaped Scratches in Chemical Mechanical Polishing

Investigation of abrasive-free slurry for polysilicon buffing chemical mechanical planarization

Study on Abnormally Accelerated Oxidation of Tungsten Plugs during Tungsten Chemical Mechanical Polishing in Semiconductor Manufacturing

Unprecedentedly Uniform, Reliable, and Centimeter-Scale Molybdenum Disulfide Negative Differential Resistance Photodetectors

Kirkendall effect induced bifunctional hybrid electrocatalyst (Co9S8@MoS2/N-doped hollow carbon) for high performance overall water splitting

Shape classification of fumed silica abrasive and its effects on chemical mechanical polishing

Low-Temperature and Large-Scale Production of a Transition Metal Sulfide Vertical Heterostructure and Its Application for Photodetectors

Communication-A Novel Method to Improve Cleaning Performance by Removing Small Particles in CMP Slurry

Recyclable free-polymer transfer of nano-grain MoS2 film onto arbitrary substrates

Low-Temperature Synthesis of Wafer-Scale MoS2-WS2 Vertical Heterostructures by Single-Step Penetrative Plasma Sulfurization