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High-dielectric-constant TiO2 thin film on a Ru electrode grown at 250℃ by atomic-layer-deposition

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Fabrication of a metal-oxide-semiconductor-type capacitive micro-tip array using HfO2 gate insulators

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Fabrication of a metal-oxide-semiconductor type micro capacitive tip array using SiO2 or HfO2 gate insulators

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Fabrication of the Capacitive Probe and Study on the C-V Characterization