Structures and Electrical Properties of Tin Doped Indium Oxide (ITO) Films Deposited on Different Substrates by Sputtering with H2O Introdution
E. Nishimura, H.Ohkawa, Y. Sato, P.K.Song, Y.Shigesato
Journal of Vacuum Society japan, 2004
92
Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films
M. Kon, P. K. Song, Y. Shigesato, P. Frach, S. Ohno, K. Suzuki
Jpn. J. Appl. Phys., 2003
93
Sn- or Hf- Doped InSbO4 Films Deposited by RF Magnetron Sputtering
P. K. Song, Y. Shimada, Y. Shigesato, T. Hattori, M. Ishida, K. Saegusa
Thin Solid Films, 2003
94
Thin film TiO2 photocatalyst deposited by reactive magnetron sputtering
M. Yamagishi, S. Kuriki, P. K. Song, Y. Shigesato
Thin Solid Films, 2003
95
Study on Thermochromic VO2 Films Grown on ZnO Coated Glass Substrates for “Smart windows”
K. Kato, P. K. Song, Y. Shigesato, H. Odaka
Jpn. J. Appl. Phys., 2003
96
Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films
S. Ohno, D. Sato, M. Kon, P. K. Song, Y. Shigesato, M. Yoshikawa, S. Suzuki, P. Frach
Thin Solid Films, 2003
97
Frequency mode with dual cathodes to deposit photocatalytic TiO2 films
S. Ohno, D. Sato, M. Kon, P. K. Song, Y. Shigesato, M. Yoshikawa, S. Suzuki, P. Frach
Thin Solid Films, 2003
98
Comparative study on structure and internal stress in tin-doped indium oxide (ITO) and indium-zinc oxide (IZO) films deposited by rf magnetron sputtering
T. Sasabayashi, N. Ito, M. Kon, P. K. Song, K. Utsumi, A. Kaijo, Y. Shigesto
Thin Solid Films, 2003
99
Microstructure of ITO films deposited by DC magnetron sputtering with H2O introduction
E. Nishimura, P. K. Song, H. Okawa, Y. Shigesato
Thin Solid Films, 2003
100
Microstructure Effect on the High-Temperature Oxidation Resistance of Ti-Si-N Coatings Layers