반도체공학회 하계종합학술대회

Epitaxial alignment 기반 저온 rutile 상 TiO2 박막 제조와 DRAM 응용성에 대한 연구

2025

The 40th international technical conference on circuits/systems, computers, and communications 2025

Low-temperature growth of rutile TiO2 using a SnO2 seed layer for high-k dielectric applications in DRAM devices

2025

The 40th international technical conference on circuits/systems, computers, and communications 2025

Performance Enhancement of Indium Oxide Thin-Film Transistors via Plasma Treatment

2025

ALD/ALE 2025

Area selective atomic layer deposition of ruthenium via plasma surface modification

2025

ALD/ALE 2025

Tailoring the scavenging effect of ALD Al2O3 passivation layer via oxidant engineering for high-performance tellurium transistors

2025