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컨퍼런스
제 32회 한국반도체학술대회
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All-Te Field Effect Transistor with Layer-Engineered Homojunction
High-k Nb2O5/2D Metallic NbS2 Gate Stack Architecture via Thermal Conversion of NbS2
Contact Resistance Reduction in Tellurium Field-Effect Transistors via Al2O3 Interlayers
Correlation Study between Raman Vibration Modes and Electrical Properties of 2D In2Se3
Contact Resistance Reduction of Te Transistor Using UVO Treatment