발행물
컨퍼런스
SPIE Advanced Lithography + Patterning
2024
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Sensitivity Improvement of Fluoroalkylated EUV Resist with Electron-rich Vinyl Units
Approach for Enhancing Sensitivity of Tin-Oxo Cages for High NA extreme UV Lithography
MNE-ES2022
2022
Iodinated Sensitisers for Chemically-amplified Photoresists used for Extreme UV Lithography
한국반도체디스플레이기술학회 2020년 온라인 추계학술대회
2020
불소화학 기반 유기 단분자 극자외선 레지스트 개발
SPIE Advanced Lithography
Molecular resists equipped with fluorinated aromatic units for electron-beam and extreme UV lithography