A brief review on the effect of impurities on the atomic layer deposited fluorite-structure ferroelectrics
이동현, 양건, 박주용, 박민혁*
J. Korean. Inst. Surf. Eng., 2020
32
Review of Electrical Characterization of Ceramic Thin Films for the Next Generation Semiconductor Devices
이동현, 양건, 박주용, 박민혁*
CERAMIST, 2019
33
Utilization of Oxygen Content Modulated Ru Electrode to Examine the Interfacial Redox Chemistry of Ferroelectric Hf0.5Zr0.5O2
Kun Yang, Hyojun Choi, Ji Sang Ahn, Eun Ji Ju, Dong In Han, Se Hyun Kim, Ju Yong Park, Heejin Hong, Kwan Hyun Park, Jeong Hwan Han*, Min Hyuk Park*
Journal of Materiomics, 1970
34
Reliability of HfO2-based FeFET memory
Reika Ichihara*, Milan Pešić, Yusuke Higashi, Min Hyuk Park
MRS Bulletin, 1970
35
Vertical Stacking of Atomic-layer-deposited Oxide Layers via Fluorinated Graphene Transfer Technique
Hyunjun Kim, Huije Ryu, Hyun Woo Jeong, Jiwoo Kim, Donghoon Moon, Sahngik Mun, Cheol Seong Hwang, Min Hyuk Park, Jangyup Son, Gwan-Hyoung Lee*
ACS Nano, 1970
36
Enhanced Ferroelectric Performance in Hf0.5Zr0.5O2 Capacitors Using Ultra-Thin MoS2 Layer for Clamping Effect and Oxygen Vacancy Suppression
Soyeon Lee, Hyun Woo Jeong, Jun-Cheol Park, Donghyeon Lee, Yong-Ryun Jo, Jiwoong Yang, Min Hyuk Park*, Sanghan Lee*
Materials & Design, 1970
37
Temperature-dependent {111}-Texture Transfer to Hf0.5Zr0.5O2 Films from {111}-Textured TiN Electrode and Its Impact on Ferroelectricity
Dong Hee Han, Seungyeon Kim, Hyun Woo Jeong, Younghwan Lee, Young Yong Kim*, Woojin Jeon*, Min Hyuk Park*
ACS Applied Materials & Interfaces, 2025.03
38
Enhancement of electrical properties of morphotropic phase boundary in Hf1-xZrxO2 films by integrating Mo electrode and TiN interlayer for DRAM capacitors
Ju Yong Park, Hyojun Choi, Jaewook Lee, Kun Yang, Sun Young Lee, Dong In Han, Intak Jeon, Chang Hwa Jung, Hanjin Lim*, Woongkyu Lee*, Min Hyuk Park*
Applied Surface Science Advances, 2025.07
39
Strategies for Reducing Operating Voltage of Ferroelectric Hafnia by Decreasing Coercive Field and Film Thickness
Dong In Han, Hyojun Choi, Dong Hyun Lee, Se Hyun Kim, Jaewook Lee, Intak Jeon, Chang Hwa Jung, Hanjin Lim*, Min Hyuk Park*
Advanced Physics Reserch, 2025.03
40
Atomic-Level Stoichiometry Control of Ferroelectric HfxZryOz Thin Films by Understanding Molecular-Level Chemical Physical Reactions
Ngoc Le Trinh, Bonwook Gu, Kun Yang, Chi Thang Nguyen, Byungchan Lee, Hyun-Mi Kim, Hyeongkeun Kim, Youngho Kang, Min Hyuk Park*, Han-Bo-Ram Lee*