InGaAs MOS gate stack formation and the MOS interface properties
S. Takagi*, N. Taoka, R. Suzuki, M. Yokoyama, S.-H. Kim, M. Takenaka
Journal of The Surface Science Society of Japan, 2012
118
Impact of atomic layer deposition temperature on HfO2/InGaAs metal-oxide-semiconductor interface properties
R. Suzuki*, N. Taoka, M. Yokoyama, S. H. Kim, T. Hoshii, T. Maeda, T. Yasuda, O. Ichikawa, N. Fukuhara, M. Hata, M. Takenaka, S. Takagi
Journal of Applied Physics, 2012
119
Characterization of Ni–GaSb Alloys Formed by Direct Reaction of Ni with GaSb
Cezar B. Zota*, S. H. Kim, M. Yokoyama, M. Takenaka, S. Takagi
Applied Physics Express, 2012
120
III-V/Ge high mobility channel integration of InGaAs nMOSFETs and Ge pMOSFETs with self-align Ni-based metal S/D
M. Yokoyama*, S.-H. Kim, R. Zhang, N. Taoka, Y. Urabe, T. Maeda, H. Takagi, T. Yasuda, H. Yamada, O. Ichikawa, N. Fukuhara, M. Hata, M. Sugiyama, Y. Nakano, M. Takenaka, S. Takagi