Ultrathin metal films with low resistivity via atomic layer deposition: Process pressure effect on initial growth behavior of Ru films

Superior and stable ferroelectric properties of hafnium-zirconium-oxide thin films deposited via atomic layer deposition using cyclopentadienyl-based precursors without annealing

Effect of NH3 flow on electrical and mechanical properties of ALD TiN thin films

2D materials-based membranes for hydrogen purification: Current status and future prospects

Low-resistivity SrRuO3 thin films formed on SiO2 substrates without buffer layer by RF magnetron sputtering

Atomic layer deposited strontium niobate thin films as new high-k dielectrics

Enhanced electrical properties of ZrO2-TiN based capacitors by introducing ultrathin metal oxides

Effects of plasma conditions on sulfurization of MoO3 thin films and surface evolution for formation of MoS2 at low temperature

Growth characteristics of tin sulphides crystals by vapor transport method using SnS and sulphur powder: effect of temperature and pressure

Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity