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컨퍼런스
제35회 한국진공학회 하계정기학술대회
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NiSi 나노점 형성 및 비휘발성 메모리 응용에 관한 연구
1st International Conference on Microelectronics and Plasma Technology
Direct Deposition of Nanocrystalline Silicon films Having Minimum Incubation Layer by Catalytic CVD at Low Temperatures
E-MRS Spring Meeting
Memory characteristics of MOSFET with silicon Nanocluster formation by a pulse-type GAS feeding Technique in the LPCVD system
Memory Characteristics of Schottky Barrier Tunneling Transistor with Si Nano Dots for a Novel Nonvolatile Memory
A High Rate Deposition of nanocrystalline Si Films at Low Temperatures by Catalytic CVD Technique