발행물
컨퍼런스
The Solid-State Device Research Conference ESSDERC
,
Thermally robust atomic layer deposited ZrO2 gate dielectric films upon the post-deposition annealing
International Conference on Atomic Layer Deposition
Reduced impurities and improved electrical property of ALD HfO2 film grown at a low temperature (100 oC) by Al2O3 incorporation