발행물
컨퍼런스
2016 International Conference on Planarization/CMP Technology (ICPT 2016)
2019
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Effect of Metal Ion Doping in Ceria Slurry for Chemical Mechanical Planarization_Jinhak Choi, Cheolmin Shin, Taesung Kim (Oral Presentation*)
Chemical Mechanical Planarization Filter Life-Cycle Enhancement Test through the Slurry Supply System_Sangyoon Shin, Horim Lee, Taesung Kim (Oral Presentation*)
Development of Real-Time and Process Monitoring of Liquid Chemical Concentration during Semiconductor Manufacturing_Kihong Park, Atul Kulkarini, Taesung Kim (Oral Presentation*)
Uurosensors 2016
2007
Fiber optic lateral coupling force sensor for biomedical applications_Jang Ah Kim, Atul Kulkarni, Changmin Kim, Kihong Park, Taesung Kim (Oral Presentation*)
Study on Effect of Back-surface Treatment of Silicon Wafer in Photo Lithography Process after CMP Process_Hyeong-U Kim, Hye Youn Kim, Atul Kulkarni, ChISUNG Ahn, Mingu Kim, Min-Ho Lee, Taesung Kim (Poster Presentation*)