발행물
컨퍼런스
International Symposium on Ultra Clean Processing of Semiconductor Surfaces
2024
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Retardation phenomenon of oxide removal during the formation dual gate oxide via PR-mask wet etching_Kihyung Ko, Myung Geun Song, Byung Kwon Cho, Bo Un Yoon, Yujin Cho, Taesung Kim (Oral Presentation*)
Effect of DI-water dilution and etchant arm movement on spinning type wet etch_Huihwan Lee, Dukmin Lim, Taesung Kim (Oral Presentation*)
나노입자공학연구실 20주년 반도체 공정 장비 산학교류회
2025
김장아 박사 방문
Illuminating BioMedTech: From Light-Matter Interactions to Micro/Nano-Scale Innovation
American Association For Aerosol Research 27th Annual Conference
1970
Monitoring of Transient Ultrafine Particle Size Distribution at a Roadside Using SMPS and TR-DMPS