Very low temperature growth of polycrystalline silicon using SiF4/H2

Low temperature polycrystalline silicon thin film transistor with silicon nitride ion stopper

Low off-state leakage current thin film transistor using Cl incorporated hydrogenated amorphous silicon

Preparation of wide band microcrystalline silicon film by using SiH2Cl2

Low temperature fabrication of APCVD a-Si thin film transistors with ion doped layer

Hydrogen passivation of dopants in amorphous silicon

Low Dielectric Constant Fluorinated Oxide Films Prepared byRemote Plasma Chemical Vapor Deposition

Change in bulk defect density of hydrogenated amorphous silicon by bias stress in thin film transistor structures

Creation of interface states between SiO2 and a-Si:H thin film transistors by bias-stress

Effect of H2 dilution on the growth of low temperature as-deposited poly-Si films using SiF4/SiH4/H2 Plasma