Polycrystalline silicon thin film transistors deposited at low substrate temperature by remote plasma chemical Vapor deposition using.

N-channel polycrystalline thin film transistors using as-deposited polycrystalline silicon and ion doping

Effect of Cl incorporation on the stability of Hydrogenated amorphous silicon

Temperature dependent characteristics of amorphous silicon thin film transistors with SiO2 gate insulator

Growth of microcrystalline silicon by remote plasma chemical vapor deposition without hydrogen dilution

Performance improvement of amorphous silicon thin-film transistors with SiO2 gate insulator by N2 plasma treatment

Annealing effects of low pressure mercury and excimer laser on degraded a-Si:H TFTs

Performance and stability of a-Si:H TFTs with SiO2 gate insulator

Photo-induced changes of thermally stimulated conductivity spectra in un doped hydrogenated amorphous silicon.

Highly stable amorphous-silicon indium-gallium-zinc-oxide thin-film transistor using an etch-stopper and a via-hole structure