,

3D feature profile simulation for high aspect ratio oxide etching with hard mask

,

현실적인 표면 반응 모델을 통한 고종횡비 식각 전산모사

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High aspect ratio etch profile simulation for next-generation semiconductor process

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Highly sensitive detection of Cu ion in water with a chelate modified field effect transistor

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Understanding the amorphous carbon hard mask etching processes in fluorocarbon plasma