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Research Trends in Plasma Process Simulation for Next Generation Devices and the Role of Academic Research

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3D feature profile simulation of amorphous carbon hard mask etching characteristics under fluorocarbon gas mixture

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Surface-amine” and “Electrical Double Layer” monitoring in FET devices via green fluorescent labeling dye and thereof sensing

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Small contact etch prediction with 3D Feature profile simulation

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Detection of copper(Ⅱ) ion in solution using FET device with dipicolylamine functionalized conducting channel