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전체 논문

172

111

SnO2 thin films grown by atomic layer deposition using a novel Sn precursor
Choi, Min-Jung, Cho, Cheol Jin, Kim, Kwang-Chon, Pyeon, Jung Joon, Park, Hyung-Ho, Kim, Hyo-Suk, Han, Jeong Hwan, Kim, Chang Gyoun, Chung, Taek-Mo, Park, Tae Joo, Kwon, Beomjin, Jeong, Doo Seok, Baek, Seung-Hyub, Kang, Chong-Yun, Kim, Jin-Sang, Kim, Seong Keun
APPLIED SURFACE SCIENCE, 201411

112

Trimethylsilylcyclopentadienyl tris(dimethylamino)zirconium as a single-source metal precursor for the atomic layer deposition of ZrxSi1-xO4
Chung, YJ (Chung, Yoon Jang), Moon, DC (Moon, Dae-Chul), Han, JH (Han, Jeong Hwan), Park, M (Park, Mira), Park, JW (Park, Jung Woo), Chung, TM (Chung, Taek-Mo), Lee, YK (Lee, Young Kuk), An, KS (An, Ki Seok)
THIN SOLID FILMS, 201408

113

Reaction Chemistry during the Atomic Layer Deposition of Sc2O3 and Gd2O3 from Sc(MeCp)(3), Gd((PrCp)-Pr-i)(3), and H2O
Han, JH (Han, Jeong Hwan), Nyns, L (Nyns, Laura), Delabie, A (Delabie, Annelies), Franquet, A (Franquet, Alexis), Van Elshocht, S (Van Elshocht,, Adelmann, C (Adelmann, Christo
CHEMISTRY OF MATERIALS, 201402

114

Chemistry of active oxygen in RuOx and its influence on the atomic layer deposition of TiO2 films
Jeon, W (Jeon, Woojin), Lee, W (Lee, Woongkyu), Yoo, YW (Yoo, Yeon Woo), An, CH (An, Cheol Hyun), Han, JH (Han, Jeong Hwan), Kim, SK (Kim, Seong Keun), Hwang, CS (Hwang, Cheol Seong)
JOURNAL OF MATERIALS CHEMISTRY C, 2014

115

Nanoscale Characterization of TiO2 Films Grown by Atomic Layer Deposition on RuO2 Electrodes
Murakami, K, Rommel, M, Hudec, B, Rosova, A, Husekova, K, Dobrocka, E, Rammula, R, Kasikov, A, Han, JH, Lee, W, Song, SJ, Paskaleva, A, Bauer, AJ, Frey, L, Frohlich, K, Aarik, J, Hwang, CS
ACS APPLIED MATERIALS & INTERFACES, 2014

116

Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials
Lee, SW, Choi, BJ, Eom, T, Han, JH, Kim, SK, Song, SJ, Lee, W, Hwang, CS
COORDINATION CHEMISTRY REVIEWS, 201312

117

Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O-3: growth behaviour and film characteristics
Han, JH (Han, Jeong Hwan), Ungur, E (Ungur, Elisaveta), Franquet, A (Franquet, Alexis), Opsomer, K (Opsomer, Karl), Conard, T (Conard, Thierry), Moussa, A (Moussa, Alain), De Gendt, S (De Gendt, Stefan), Van Elshocht, S (Van Elshocht,, Adelmann, C (Adelmann, Christo
JOURNAL OF MATERIALS CHEMISTRY C, 2013

118

Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal-Insulator-Metal Capacitors
Lee, W, Han, JH, Jeon, W, Yoo, YW, Lee, SW, Kim, SK, Ko, CH, Lansalot-Matras, C, Hwang, CS
CHEMISTRY OF MATERIALS, 2013

119

Highly Improved Uniformity in the Resistive Switching Parameters of TiO2 Thin Films by Inserting Ru Nanodots
Yoon, JH, Han, JH, Jung, JS, Jeon, W, Kim, GH, Song, SJ, Seok, JY, Yoon, KJ, Lee, MH, Hwang, CS
ADVANCED MATERIALS, 2013

120

Impact of Bimetal Electrodes on Dielectric Properties of TiO2 and Al-Doped TiO2 Films
Kim, SK, Han, S, Jeon, W, Yoon, JH, Han, JH, Lee, W, Hwang, CS
ACS APPLIED MATERIALS & INTERFACES, 201209