발행물

전체 논문

172

131

Effect of crystalline structure of TiO2 substrates on initial growth of atomic layer deposited Ru thin films
Kim, SK (Kim, Seong Keun), Han, S (Han, Sora), Han, JH (Han, Jeong Hwan), Hwang, CS (Hwang, Cheol Seong)
APPLIED SURFACE SCIENCE, 201102

132

Role of Interfacial Reaction in Atomic Layer Deposition of TiO2 Thin Films Using Ti(O-iPr)(2)(tmhd)(2) on Ru or RuO2 Substrates
Lee, SW (Lee, Sang Woon), Han, JH (Han, Jeong Hwan), Kim, SK (Kim, Seong Keun), Han, S (Han, Sora), Lee, W (Lee, Woongkyu), Hwang, CS (Hwang, Cheol Seong)
CHEMISTRY OF MATERIALS, 201102

133

Local Epitaxial Growth of Ru Thin Films by Atomic Layer Deposition at Low Temperature
Kim, SK (Kim, Seong Keun), Han, S (Han, Sora), Kim, GH (Kim, Gun Hwan), Jang, JH (Jang, Jae Hyuck), Han, JH (Han, Jeong Hwan), Hwang, CS (Hwang, Cheol Seong)
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2011

134

Electrically Benign Ru Wet Etching Method for Fabricating Ru/TiO2/Ru Capacitor
Lee, SY (Lee, Sang Young), Kim, SK (Kim, Seong Keun), Kim, KM (Kim, Kyung Min), Choi, GJ (Choi, Gyu-Jin), Han, JH (Han, Jeong Hwan), Hwang, CS (Hwang, Cheol Seong)
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2011

135

Growth of RuO2 Thin Films by Pulsed-Chemical Vapor Deposition Using RuO4 Precursor and 5% H-2 Reduction Gas
Han, JH (Han, Jeong Hwan), Lee, SW (Lee, Sang Woon), Kim, SK (Kim, Seong Keun), Han, S (Han, Sora), Hwang, CS (Hwang, Cheol Seong), Dussarrat, C (Dussarrat, Chris, Gatineau, J (Gatineau, Julien)
CHEMISTRY OF MATERIALS, 201010

136

A theoretical model for Schottky diodes for excluding the sneak current in cross bar array resistive memory
Kim, GH (Kim, Gun Hwan), Kim, KM (Kim, Kyung Min), Seok, JY (Seok, Jun Yeong), Lee, HJ (Lee, Hyun Ju), Cho, DY (Cho, Deok-Yong), Han, JH (Han, Jeong Hwan), Hwang, CS (Hwang, Cheol Seong)
NANOTECHNOLOGY, 201009

137

Capacitors with an Equivalent Oxide Thickness of < 0.5 nm for Nanoscale Electronic Semiconductor Memory
Kim, SK (Kim, Seong Keun), Lee, SW (Lee, Sang Woon), Han, JH (Han, Jeong Hwan), Lee, B (Lee, Bora), Han, S (Han, Seungwu), Hwang, CS (Hwang, Cheol Seong)
ADVANCED FUNCTIONAL MATERIALS, 201009

138

Permittivity Enhanced Atomic Layer Deposited HfO2 Thin Films Manipulated by a Rutile TiO2 interlayer
Seo, M (Seo, Minha), Kim, SK (Kim, Seong Keun), Han, JH (Han, Jeong Hwan), Hwang, CS (Hwang, Cheol Seong)
CHEMISTRY OF MATERIALS, 201008

139

Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition
Kim, SK (Kim, Seong Keun), Han, JH (Han, Jeong Hwan), Kim, GH (Kim, Gun Hwan), Hwang, CS (Hwang, Cheol Seong)
CHEMISTRY OF MATERIALS, 201005

140

Electrically Benign Dry-Etching Method for Rutile TiO2 Thin-Film Capacitors with Ru Electrodes
Kim, KM (Kim, Kyung Min), Lee, SY (Lee, Sang Young), Choi, GJ (Choi, Gyu Jin), Han, JH (Han, Jeong Hwan), Hwang, CS (Hwang, Cheol Seong)
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2010