발행물

전체 논문

172

121

Schottky diode with excellent performance for large integration density of crossbar resistive memory
Gun Hwan Kim, Jong Ho Lee, Jeong Hwan Han, Seul Ji Song, Jun Yeong Seok, Jung Ho Yoon, Kyung Jean Yoon, Min Hwan Lee, Tae Joo Park, Cheol Seong Hwang
APPLIED PHYSICS LETTERS, 201205

122

Study on Initial Growth Behavior of RuO2 Film Grown by Pulsed Chemical Vapor Deposition: Effects of Substrate and Reactant Feeding Time
Han, JH (Han, Jeong Hwan), Lee, SW (Lee, Sang Woon), Kim, SK (Kim, Seong Keun), Han, S (Han, Sora), Lee, W (Lee, Woongkyu), Hwang, CS (Hwang, Cheol Seong)
CHEMISTRY OF MATERIALS, 201204

123

Controlling the initial growth behavior of SrTiO3 films by interposing Al2O3 layers between the film and the Ru substrate
Lee, W, Han, JH, Lee, SW, Han, S, Jeon, WJ, Hwang, CS
JOURNAL OF MATERIALS CHEMISTRY, 2012

124

Strain evolution of each type of grains in poly-crystalline (Ba,Sr)TiO3 thin films grown by sputtering
Park, WY, Park, MH, Lee, JH, Yoon, JH, Han, JH, Choi, JH, Hwang, CS
SCIENTIFIC REPORTS, 2012

125

Growth of Conductive SrRuO3 Films by Combining Atomic Layer Deposited SrO and Chemical Vapor Deposited RuO2 Layers
Han, JH, Lee, W, Jeon, W, Lee, SW, Hwang, CS
CHEMISTRY OF MATERIALS, 2012

126

Atomic layer deposition of TiO2 and Al-doped TiO2 films on Ir substrates for ultralow leakage currents
Kim, SK (Kim, Seong Keun), Han, S (Han, Sora), Han, JH (Han, Jeong Hwan), Lee, W (Lee, Woongkyu), Hwang, CS (Hwang, Cheol Seong)
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 201108

127

Improvement in the leakage current characteristic of metal-insulator-metal capacitor by adopting RuO2 film as bottom electrode
Han, JH (Han, Jeong Hwan), Han, S (Han, Sora), Lee, W (Lee, Woongkyu), Lee, SW (Lee, Sang Woon), Kim, SK (Kim, Seong Keun), Gatineau, J (Gatineau, Julien), Dussarrat, C (Dussarrat, Chris, Hwang, CS (Hwang, Cheol Seong)
APPLIED PHYSICS LETTERS, 201107

128

Electrical properties of TiO2-based MIM capacitors deposited by TiCl4 and TTIP based atomic layer deposition processes
Hudec, B (Hudec, Boris), Husekova, K (Husekova, Kristin, Tarre, A (Tarre, Aivar), Han, JH (Han, Jeong Hwan), Han, S (Han, Sora), Rosova, A (Rosova, Alica), Lee, W (Lee, Woongkyu), Kasikov, A (Kasikov, Aarne), Song, SJ (Song, Seul Ji), Aarik, J (Aarik, Jaan), Hwang, CS (Hwang, Cheol Seong), Frohlich, K (Froehlich, Karol)
MICROELECTRONIC ENGINEERING, 201107

129

The mechanism for the suppression of leakage current in high dielectric TiO2 thin films by adopting ultra-thin HfO2 films for memory application
Seo, M (Seo, Minha), Rha, SH (Rha, Sang Ho), Kim, SK (Kim, Seong Keun), Han, JH (Han, Jeong Hwan), Lee, W (Lee, Woongkyu), Han, S (Han, Sora), Hwang, CS (Hwang, Cheol Seong)
JOURNAL OF APPLIED PHYSICS, 201107

130

Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors
Lee, SW (Lee, Sang Woon), Han, JH (Han, Jeong Hwan), Han, S (Han, Sora), Lee, W (Lee, Woongkyu), Jang, JH (Jang, Jae Hyuck), Seo, M (Seo, Minha), Kim, SK (Kim, Seong Keun), Dussarrat, C (Dussarrat, C.), Gatineau, J (Gatineau, J.), Min, YS (Min, Yo-Sep), Hwang, CS (Hwang, Cheol Seong)
CHEMISTRY OF MATERIALS, 201104