Al-doped TiO2 films with ultralow leakage currents for next generation DRAM capacitors
Kim, SK (Kim, Seong Keun), Choi, GJ (Choi, Gyu-Jin), Lee, SY (Lee, Sang Young), Seo, M (Seo, Minha), Lee, SW (Lee, Sang Woon), Han, JH (Han, Jeong Hwan), Ahn, HS (Ahn, Hyo-Shin), Han, S (Han, Seungwu), Hwang, CS (Hwang, Cheol Seong)
ADVANCED MATERIALS, 200804