발행물
컨퍼런스
한국반도체디스플레이기술학회 추계학술대회
2018
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Development of high aspect ratio TSV process with single suppressing Cu electrodeposition
ENGE2018
Spaling of a Membrane Si Layer by Electrodeposit-Assisted Stripping (EAS) Process for Emiiter Wrap Through solar cell substrate
Selective Cu Electrodeposition for Sub-Micrometer Redistribution Layers using Microcontact Printing
A study of Cobalt Bottom-up Filing of Through-Silicon-Vias by Electrodeposition in the Single Additive Bath
High entropy single element (HESE) copper-to-copper direct bonding