Relation between work function and structural properties of triangular defects in 4H-SiC epitaxial layer: Kelvin probe force microscopic and spectroscopic analyses

Plasma Damage Effects on SiO2 Thin Films Determined by Nanoindenter Under Various Etching Conditions Using ACP Source

Analysis and Measurement of Volume Change by Transformation of Crystal Between Hf and HfOx Thin Film During Oxidation Using Nanoindenter

Suppression of interface roughness between BaTiO3 film and substrate by Si3N4 buffer layer regarding aerosol deposition process

Nanomechanical Analysis of a UV treated Ag thin film based on a three-step oxidation model

Nanomechanical Analysis of Etched Si Surface for Adaptively Coupled Plasma Etching System for Sub-20nm SADP Process Applications

Dielectric strength of voidless BaTiO3 films with nano-scale grains fabricated by aerosol deposition

Nanoscale Mapping of Ag anode Surface Potential for High-Performance T-Organic Light-Emitting Diode Using Kelvin Probe Force Microscopy

Young`s modulus of ZnO microwires determined by various mechanical measurement methods

Mechanical behaviors of crust layer in high-dose ion implanted-photoresist (HDI-PR) upon exposure to atmospheric pressure oxygen plasma: A measuring “pop-in” point in nanoindentation