Substrate-dependent growth of polycrystalline silicon films prepared by plasma-enhanced chemical vapor deposition using SiF₄and H₂gases

New method to improve thermal stability in the interface of silicon and tungsten by the interposition of plasma deposited tungsten nitride thin film

Performance of the plasma deposited tungsten nitride barrier layer to prevent the interdiffusion of Al and Si.

Stress relaxation in plasma deposited tungsten nitride/tungsten bilayer

Interface and electrical properties of plasma deposited tungsten and tungsten nitride schottky contacts to GaAs.

TEM studies of plasma deposited tungsten and tungsten nitride barriers for thermally stable metallization

Effects of Pt/W67N33 bottom electrode on dielectric properties of BaTiO₃ thin films

플라즈마 화학증착된 텅스텐 질화막의 질소농도제어

Characteristics of plasma enhanced chemical vapor deposited tungsten nitride thin films

Fast solid-phase cry stallization of amorphous silicon films on glue using low-temperature multi-step rapid thermal annealing