발행물
컨퍼런스
The 32nd Korean Conference on Semiconductors
2025.02
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Stress Effects on (Hf, Zr)O₂ Ferroelectrics Induced by Different Substrates
BEOL-compatible and Robust Ferroelectricity in 5 nm-thick Hf0.5Zr0.5O2 film by Adopting TiN and Mo Alloy Electrode
Understanding Domain switching Kinetics in Ferroelectric HfO2 : A Pseudo-voigt and Machine Learning Approach
InGaZnOx Thin-Film Transistors with Atomic Layer Deposition for Enhanced Mobility and Low Subthreshold Swing
한국재료학회 추계학술대회
2024.11
Comparative study on Nucleation Limited Switching in HfO2/ZrO2 Nanolaminates and (Hf,Zr)O2 Solid Solutions