2024.11

,

Atomic Layer Deposited InGaZnOx Thin-Film Transistors for Low Subthreshold Swing and High Mobility

2024.11

,

Defect Engineering via Sputtering in Non-volatile Antiferroelectric HfxZr1-xO₂ Thin Films for Low-power, Highendurance

2024.11

,

Crystallographically Controlled N-Terminated (111)-Textured TiN Electrodes for Enhanced Low-Voltage Switching (0.8 V) in Ferroelectric Hf0.5Zr0.5O2 Capacitors

2024.10

,

Effect of Nitrogen Atom Doping on Molybdenum Electrode for Enhancing the Reliability of Hf0.5Zr0.5O2 Ferroelectric Capacitors

2024.10

,

Demonstration of wake-up free and high endurance (~10 10 cycles) Hf0.5Zr0.5O2 thin film via alloy electrodes