발행물
컨퍼런스
29th Korean Semiconductor Conference
2023.02
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Ferroelectric (Hf,Zr)O₂/Si Interface Engineering for Advanced Ferroelectric Field-Effect Transistors
Dynamics of Domain Wall Motion and Polarization Switching Kinetics of Ferroelectric Hf₀.₅Zr₀.₅O₂ Thin Film on Different Electrode Materials
Reduction of SiOₓ Interface Layer Utilizing the Remote Scavenging Effect of Ti Layer on Ferroelectric (Hf,Zr)O₂ Thin Film
Dielectric Union Symposium 2023
2023
Material Issues in Fluorite-Structured Ferroelectrics
The Low Thermal Budget Remote Scavenging Effect of Ti on the Ferroelectric Hf₀.₅Zr₀.₅O₂ Thin Film