2024.04

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Modulation of domain dynamics and kinetics in ferroelectric Hf0.5Zr0.5O2 thin films using electrode materials

2024

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Ferroelectricity of Hf0.5Zr0.5O2 Thin Film Induced at 350 ℃ by Thermally Accelerated Nucleation during Atomic Layer Deposition

2024

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Interface engineering for enhancement of ferroelectricity in sub-5nm ultrathin Hf0.5Zr0.5O2 films

2024

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Compare the Switching Kinetics of HfO2-ZrO2 Nanolaminates Structures and (Hf,Zr)O2 Solid Solutions Utilizing the Nucleation Limited Switching Model

2024

,

The Remote Scavenging Effect of TiN/Ti/TiN Electrode Enhances the Ferroelectricity of Hf0.5Zr0.5O2 Thin Films