2024.10

,

Impact of deposition temperature on structural and electrical properties of Hf0.5Zr0.5O2 film on (111)-oriented TiN film

2024.10

,

Sub-5 nm Hf0.5Zr0.5O2 films with Pr higher than 30 μC/cm2 in Mo/HZO/TiO2/SiO2/Si capacitor

2024.04

,

Mo/Hf0.5Zr0.5O2/TiN/Mo Structure for Enhanced Dielectric Constant with Low Leakage Current Density for DRAM Capacitor

2024.04

,

Low-Thermal-Budget (350 ℃) Ferroelectric Hf0.5Zr0.5O2 Thin Film by Thermally Accelerating Nucleation During Atomic Layer Deposition

2024.04

,

Sub-5 nm Hf0.5Zr0.5O2 films with Pr higher than 30 μC/cm2 in Mo/HZO/TiO2/SiO2/Si capacitor