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41
Carbon contamination of EUV mask and its effect on CD performance
S Lee, JG Doh, JU Lee, I Lee, CY Jeong, DG Lee, S Rah, J Ahn
Current Applied Physics, 1970
42
Principles of photolithography
JH Ahn, SS Lee
Physics and High Technology, 1970
43
Determination of the CD performance and carbon contamination of an EUV mask by using a coherent scattering microscopy/in-situ contamination system
Jonggul Doh, Chang Young Jeong, Sangsul Lee, Jae Uk Lee, Han-sun Cha, Jinho Ahn, Dong Gun Lee, Seong Sue Kim, Han Ku Cho, Seungyu Rah
Journal of the Korean Physical Society, 1970
44
Influence of MEEF change on the mask shadowing effect in extreme ultraviolet lithography
CY Jeong, S Lee, HD Shin, TG Kim, J Ahn
Microelectronic engineering, 1970
45
Improvement of imaging properties by optimizing the capping structure in extreme ultraviolet lithography
CY Jeong, S Lee, HD Shin, TG Kim, J Ahn
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1970
46
Characteristics of Pentacene Organic Field-Effect Transistors with Self-Assembled-Monolayer-Treated HfO2 Gate Oxide
S Lee, SS Lee, JH Park, IS Park, J Ahn
Japanese Journal of Applied Physics, 1970
47
Effect of attenuated phase shift mask structure on extreme ultraviolet lithography
HD Shin, CY Jeoung, TG Kim, S Lee, IS Park, J Ahn
Japanese Journal of Applied Physics, 1970
48
Mechanically flexible low-leakage multilayer gate dielectrics for flexible organic thin film transistors
YG Seol, HY Noh, SS Lee, JH Ahn, NE Lee
Applied Physics Letters, 1970
49
The study of attenuated PSM structure for extreme ultraviolet lithography with minimized mask shadowing effect
CY Jeong, BH Kim, TG Kim, S Lee, EJ Kim, HK Oh, IS Park, J Ahn
Emerging Lithographic Technologies XII, 1970
50
Effects of additive during inductively coupled plasma etching of TaN and for gate stack patterning
JH Ko, DY Kim, MS Park, NE Lee, SS Lee, J Ahn, H Mok
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1970
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