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Direct Depositon of poly-si Films by catalytic CVD at Low Temperatures(<200)
홍완식, 김태환, 이경민
/, 200801

92

Performaance of Thin Film Transistors Having an As-Deposited Polycrystalline Silicon Channel layer
홍완식, 조현준, 김태환, 이경민
IMID `07 DIGEST, 200708