High-rate, Low-temperature Deposition of Multifunctional Nano-crystalline Silicon Nitride Films

마이크로크리스탈 실리콘 기술 동향

플랙시블 기판 위에서 제작된 단일 ZnO 나노선 inverter 논리소자

쇼트키 장벽 관통 트랜지스터 구조를 적용한 실리콘 나노점 부유 게이트 비휘발성 메모리 특성

Direct Deposition of Poly-Si Films at a High Rate by Using Catalytic CVD at a Low Temperature (180oC)

Nonvolatile Memory Characteristics of Double-Stacked Si Nanocluster Floating Gate Transistor

Formation of Si quantum dots in SiNx film by using Cat-CVD at low temperature (<200)

The memory characteristics of NVM with n-doped Si nanocrystal

Resistance changing characteristics of Pr0.7Ca0.3MnO3 film with SrRuO3 buffer layer for ReRAM applications

Memory characteristic of MOSFET with Ni nanocrystal