Nonvolatile memory characteristics of metallic nanodots as charge-storage nodes
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MICROELECTRONIC ENGINEERING, 200812
42
Gate insulator inhomogeneity in thin film transistors having a polycrystalline silicon layer prepared directly by catalytic chemical vapor deposition at a low temperature
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JAPANESE JOURNAL OF APPLIED PHYSICS, 200712
43
Direct Deposition of Polycrystalline Silicon Films on Plastic Substrates by Catalytic CVD for Thin Film Transistors
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제32회 한국진공학회 초록집 - 직접입력, 2007
44
Ion Shower Doping of Polysilicon Films on Polyethersulfone Substrates for Flexible TFT Arrays
10058402
Electrochemical and Solid State Letters - 직접입력, 200605
45
Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition (<150 °C) and Laser Crystallization for Polycrystalline Silic
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Japanese Journal of Applied Physics, Part 2 - 직접입력, 200603
46
Ultra-Low Temperature Process by Ion Shower Doping Technique for Poly-Si TFTs on Plastics
10058402
Journal of the Korean Physical Society - 등재, 200601
47
50nm thick as-deposited poly silicon as an active layer of TFT for driving AM-OLEDs prepared at low temperature (<200°C) using Cat-CVD
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IMID/IDMC '06 Digest - 직접입력, 2006
48
Low Temperature Deposition of Sillicon Nitride Films on Plastic Substrates by Catalytic CVD Technique
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Materials Research Society Spring Meeting - 직접입력, 2006
49
Plasma Control Using Neural Network and Optical Emission Spectroscopy
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Journal of Vacuum Science and Technology - 직접입력, 200503
50
Interface Modification for OTFTs Using a Statistical Optimization Method
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Electrochemical and Solid State Letters - 직접입력, 200410