발행물

전체 논문

92

21

Study of Nanocrystalline Silicon Films Synthesized Below 100 degrees C by Catalytic Chemical Vapor Deposition
홍완식, 금기수, 송태호
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 201311

22

Optical and Structural Properties of Nanocrystalline Silicon Potential Well Structure Fabricated by Cat-Chemical Vapor Deposition at 200 degrees C
홍완식, 송태호, 금기수, 강신영
Journal of Nanoscience and Nanotechnology, 201311

23

Characteristiscs of Nanocrystalline Silicon Films Deposited by Cat-CVD Below 100 ℃
홍완식, 송태호
ECS Transactions, 201310

24

The Effect of Post-Annealing on the Properties of a Pulsed-Laser-Deposited La0.6Sr0.4CoO3-delta-Ce0.9Gd0.1O2-delta Nano-Composite Cathode
홍완식, 김강철, 박정훈, 손지원, 윤경중, 이종호, 장혜정
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 201309

25

Characteristics of Silicon Nitride Films Deposited by Cat-CVD at a Low Temperature (100 ℃)
홍완식, 박정훈, 강신영, 금기수, 송태호
ECS Transactions,, 201307

26

Study of Low Temperature (180oC) Dual-Select-Diode for Applications to Pixel Switching Devices for Flexible Displays
홍완식, 송태호, 박정훈, 금기수, 강신영
ECS Transactions, 201307

27

Characteristiscs of Nanocrystalline Silicon Films Deposited by Cat-CVD Below 100oC
홍완식, 김진운, 박정훈, 강신영, 금기수, 송태호
ECS Transactions, 201303

28

Annealing Effect of Low-Temperature (<150oC) Cat-CVD Gate Dielectric Silicon Nitride Films Diluted with Atomic Hydrogen
홍완식, 노길선, 황재담, 이경민, 금기수
JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY, 201109

29

Effect of Atomic Hydrogen in SiNx Films for Gate Dielectric of Silicon-Based TFTs Fabricated at a Low-Temperature(150 °) by Cat-CVD
홍완식
ECS Transactions, 201108

30

The Hysteresis Characteristics of Low Temperature ( 200 °) Silicon Nanocrystals Embedded in Silicon-Rich Silicon Nitride Films
홍완식
ECS Transactions, 201107