2021

,

Study on uniform deposition on 300 mm silicon wafer with sub-100 nm sized particles for cleaning application

2021

,

Investigation of Contaminants in Single Wafer Wet Cleaning Using Isopropyl Alcohol

2021

,

Ultrafine Particle Removal in the Wafer Cleaning Process Using an Aqueous Solution with a High Concentration of Dissolved O3 and HF

2021

,

Effect of Viscosity on Ceria Abrasive Removal in the Buffing CMP Process

2021

,

Effects of etch back on Cell for an Advanced Vertical NAND manufacturing process using gas reactor