Self-cleaning mechanisms according to the wettability of the surface and deposition material

Combined simulation of micro and nanoparticles in RF inductively coupled plasma torches with the variations of metallic species and feeding nozzle location

First-Principles Investigation of Morphological Evolution of Tungsten Growth on Alumina Surfaces: Implications for Thin-Film Growth

Helium Metastable Distributions and Their Effect on the Uniformity of Hydrogenated Amorphous Silicon Depositions in He/SiH4 Capacitively Coupled Plasmas

Importance of higher-level excited species in argon remote plasma sources: Numerical modeling with consideration of detailed chemical reaction pathways

Importance of Dielectric Elements for Attaining Process Uniformity in Capacitively Coupled Plasma Deposition Reactors

Kinetic analysis of electrode heating effects in a Torr-regime capacitively coupled plasma reactor: 2-D particle-in-cell simulation study

Effects of quenching gas feeding on silver nanoparticle synthesis by the inductively coupled plasma torch

Theoretical analysis of Si2H6 adsorption on hydrogenated silicon surfaces for fast deposition using intermediate pressure SiH4 capacitively coupled plasma

Enhancement of cleanliness and deposition rate by understanding the multiple roles of the showerhead electrode in a capacitively coupled plasma reactor