Computational fluid dynamics analysis of particle deposition induced by a showerhead electrode in a capacitively coupled plasma reactor

Influence of the gas pressure in a Torr regime capacitively coupled plasma deposition reactor

Effect of electrode heating on the distribution of the ion production rate in a capacitively coupled plasma deposition reactor in consideration of thermal decomposition

Analysis of thermal diffusion effects observed in a capacitively coupled plasma deposition reactor with non-isothermal walls

The influence of hydrogen concentration in amorphous carbon films on mechanical properties and fluorine penetration: a density functional theory and ab initio molecular dynamics study

First principles investigation on energetics, structure, and mechanical properties of amorphous carbon films doped with B, N, and Cl

The ion kinetics at the wafer edge by the variation of geometry and permittivity of the focus ring in capacitively coupled discharges

Numerical analysis for optimization of the sidewall conditions in a capacitively coupled plasma deposition reactor

Analysis of surface adsorption kinetics of SiH4 and Si2H6 for deposition of a hydrogenated silicon thin film using intermediate pressure SiH4 plasmas

Effects of nitrogen doping in amorphous carbon layers on the diffusion of fluorine atoms: A first-principles study