Improved ferroelectric switching endurance of La-doped Hf0.5Zr0.5O2 thin films
Anna G. Chernikova, Maxim G. Kozodaev, Dmitry V. Negrov, Evgeny V. Korostylev, Min Hyuk Park, Uwe Schroeder, Cheol Seong Hwang, A. M. Markeev*
ACS Appl. Mater. Interfaces, 2018.01
122
Understanding the formation of the metastable ferroelectric phase in hafnia-zirconia solid solution thin films
Min Hyuk Park, Young Hwan Lee, Han Joon Kim, Yu Jin Kim, Thomas Mikolajick, Uwe Schroeder, Cheol Seong Hwang*
Nanoscale, 2018.01
123
Temporary formation of highly conducting domain walls for non-destructive read-out of ferroelectric domain-wall resistance switching memories
Jun Jiang, Zi Long Bai, Zhi Hui Chen, Long He, David Wei Zhang, Qing Hua Zhang, Jin An Shi, Min Hyuk Park, James F. Scott, Cheol Seong Hwang, An Quan Jiang*
Nat. Mater., 2018
124
Voltage drop in a ferroelectric single layer capacitor by retarded domain nucleation
Yu Jin Kim, Hyeon Woo Park, Seung Dam Hyun, Han Joon Kim, Keum Do Kim, Young Hwan Lee, Taehwan Moon, Min Hyuk Park, Cheol Seong Hwang*
Nano Lett., 2017.12
125
Si Doped HfO2 - A Fragile Ferroelectric System
C. Richter, T. Schenk, M. H. Park, F. A. Tscharnkte, E. D. Grimley, J. M. LeBeau, C. Zhou, J. L. Jones, T. Mikolajick, U. Schroeder*
Adv. Electron. Mater., 2017.10
126
Ferroelectric properties of lightly doped La:HfO2 thin films grown by plasma-assisted atomic layer deposition
Maxim Kozodaev, Anna Chernikova, Evgeny Korostylev, Min Hyuk Park, Uwe Scrhroeder, Cheol Seong Hwang, Andrey Markeev*
Appl. Phys. Lett., 2017.09
127
Scale-up and Optimization of HfO2-ZrO2 Solid Solution Thin Films for the Electrostatic Supercapacitors
Keum Do Kim, Young Hwan Lee, Taehong Gwon, Yu Jin Kim, Han Joon Kim, Taehwan Moon, Seung Dam Hyun, Hyeon Woo Park, Min Hyuk Park*, Cheol Seong Hwang*
Nano Energy, 2017.09
128
Surface and grain boundary energy as the key enabler to ferroelectricity in nanoscale hafnia-zirconia: comparison of model and experiment
Min Hyuk Park, Young Hwan Lee, Han Joon Kim, Tony Schenk, Keum Do Kim, Thomas Mikolajick, Uwe Schroeder*, Cheol Seong Hwang*
Nanoscale, 2017.07
129
Preparation and characterization of ferroelectric Hf0.5Zr0.5O2 thin films grown by reactive sputtering
Young Hwan Lee, Han Joon Kim, Taehwan Moon, Keum Do Kim, Seung Dam Hyun, Hyun Woo Park, Yong Bin Lee, Min Hyuk Park*, Cheol Seong Hwang*
Nanotechnology, 2017.07
130
Optimizing process conditions for improved Hf1−xZrxO2 ferroelectric capacitor performance
Terence Mittmann*, Franz P. G. Fengler, Claudia Richter, Min Hyuk Park, Thomas Mikolajick, Uwe Schroeder