An Quan Jiang, Xiang Jian Meng, David Wei Zhang, Min Hyuk Park, Sijung Yoo, Yu Jin Kim, James F. Scott*, Cheol Seong Hwang*
Sci. Rep., 2015.10
145
Study on the internal field and conduction mechanism of atomic layer deposited ferroelectric Hf0.5Zr0.5O2 thin films
Min Hyuk Park, Han Joon Kim, Yu Jin Kim, Taehwan Moon, Keum Do Kim, Young Hwan Lee, Seung Dam Hyun, Cheol Seong Hwang*
J. Mater. Chem. C, 2015.06
146
Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-based Films
Min Hyuk Park, Young Hwan Lee, Han Joon Kim, Yu Jin Kim, Taehwan Moon, Keum Do Kim, Johannes Müller, Alfred Kersch, Uwe Schroeder, Thomas Mikolajick, Cheol Seong Hwang*
Adv. Mater., 2015.03
147
Toward a multifunctional monolithic device based on pyroelectricity and the electrocaloric effect of thin antiferroelectric HfxZr1-xO2 films
Min Hyuk Park, Han Joon Kim, Yu Jin Kim, Taehwan Moon, Keum Do Kim, Cheol Seong Hwang*
Nano Energy, 2015.03
148
Thin HfxZr1-xO2 Films: A New Lead-Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability
Min Hyuk Park, Han Joon Kim, Yu Jin Kim, Taehwan Moon, Keum Do Kim, Cheol Seong Hwang*
Adv. Energy Mater., 2014.11
149
Grain size engineering for ferroelectric Hf0.5Zr0.5O2 films by an insertion of Al2O3 interlayer
Han Joon Kim, Min Hyuk Park, Yu Jin Kim, Young Hwan Lee, Woojin Jeon, Taehong Gwon, Taehwan Moon, Keum Do Kim, Cheol Seong Hwang*
Appl. Phys. Lett., 2014.11
150
Effect of the annealing temperature of thin Hf0.3Zr0.7O2 films on their energy storage behavior
Min Hyuk Park, Han Joon Kim, Yu Jin Kim, Taehwan Moon, Keum Do Kim, Cheol Seong Hwang*