Acoustic power dependent detachment of PSL particles adhered to glass surfaces by dissolved gas and anionic surfactant in an ultrasonic field

Benzethonium chloride as a tungsten corrosion inhibitor in neutral and alkaline media for the post-chemical mechanical planarization application

Effect of ammonium halide salts on wet chemical nanoscale etching and polishing of InGaAs surfaces for advanced CMOS devices

Effect of slurry particles on PVA brush contamination during post-CMP cleaning

Effect of Slurry Additives on Co-BTA Complex Stability and Inhibition Property During Co CMP Process

Theoretical validation of inhibition mechanisms of benzotriazole with copper and cobalt for CMP and post-CMP cleaning applications

Effect of pH and Ion Concentration on Wetting of Nanoholes and Water Structuring

Effect of Skin Layer on Brush Loading, Cross-Contamination, and Cleaning Performance during Post-CMP Cleaning

Study on PVA Brush Loading and Conditioning during Shallow Trench Isolation Post-CMP Cleaning Process

Chemically controlled megasonic cleaning of patterned structures using solutions with dissolved gas and surfactant