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231
Gate-induced drain leakage (GIDL) in MFMIS and MFIS negative capacitance FinFETs
Gihun Choe, 민진홍, 신창환, 신창환
CURRENT APPLIED PHYSICS, 2020
232
Electrical Characteristics of Nanoelectromechanical Relay with Multi-Domain HfO2-Based Ferroelectric Materials
신창환, 신창환, 윤찬근
ELECTRONICS, 2020
233
Electrical Characteristics of Bulk FinFET According to Spacer Length
Hwasung Rhee, Jaemin Kim, Jinsu Park, Myung Soo Yeo, Sanchari Showdhury, 신창환, 신창환, 이준신, 조은철
ELECTRONICS, 2020
234
Experimental study of interface traps in MOS capacitor with Al-doped HfO2
서지호, 신창환, 신창환
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2020
235
Device Design Guideline for HfO2-Based Ferroelectric-Gated Nanoelectromechanical System
민진홍, 신재민, 신창환, 신창환, 윤찬근
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2020
236
Investigation on Threshold Voltage Adjustment of Threshold Switching Devices with HfO2/Al2O3 Superlattice on Transparent ITO/Glass Substrate
문승준, 신재민, 신창환, 신창환, 최예주
MICROMACHINES, 2020
237
Compact model for PZT ferroelectric capacitors with voltage dependent switching behavior
Bo-Han Qiu, Cheng Yan Chiu, Chien-Wei Wang, Darsen Lu, Hansol Ku, Sourav De, 신창환, 신창환
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2020
238
Energy-Delay Sensitivity Analysis of a Nanoelectromechanical Relay With the Negative Capacitance of a Ferroelectric Capacitor
GIHUN CHOE, 신창환, 신창환, 윤찬근
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2020
239
Optimization of double metal-gate InAs/Si heterojunction nanowire TFET
Eunah Ko, 신창환, 신창환, 최예주, 홍유리
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2020
240
Device-design optimization of ferroelectric-gated vertical tunnel field-effect transistor to suppress ambipolar current
신창환, 신창환, 정태환
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2020
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