Dry Etching of Al2O3 Thin Films in O2/BCl3/Ar Inductively Coupled Plasma

The etching characteristics of Al2O3 thin films in an inductively coupled plasma

Surface properties of etched ITO thin films using high density plasma

Dry-etching properties of TiN for metal/high-k gate stack using BCl3-based inductively coupled plasma

Etch Characteristics of ZrO2 Thin Films in High Density Plasma

Temperature dependence on dry etching of Al2O3 thin films in BCl3/Cl2/Ar plasma

Dry etching of CoFe films using a CH4/Ar inductively coupled plasma for magnetic random access memory application

Improving the Etch Selectivity of ZrO2 Thin Films over Si by Using High Density Plasma

The Etching Properties of Al2O3 Thin Films in BCl3/Cl2/Ar Plasma

Dry Etching of TaN Thin Films by Using an Inductively Coupled Plasma