Controlling the Electrical Characteristics of ZrO2/Al2O3/ZrO2 Capacitors by Adopting a Ru Top Electrode Grown via Atomic Layer Deposition
2019.03
원저자: Cheol Hyun An | WILEY? VCH Verlag Berlin GmbH
Effect of Growth Temperature during the Atomic Layer Deposition of the SrTiO3 Seed Layer on the Properties of RuO2/SrTiO3/Ru Capacitors for Dynamic Random Access Memory Applications
2018.11
원저자: Sang Hyeon Kim | American Chemical Society
Electrical Properties of ZrO2/Al2O3/ZrO2‐Based Capacitors with TiN, Ru, and TiN/Ru Top Electrode Materials
2018.10
원저자: Woongkyu Lee | WILEY? VCH Verlag Berlin GmbH
Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment
2017
원저자: Min Hyuk Park | Royal Society of Chemistry
Structure and electrical properties of Al-doped HfO2 and ZrO2 films grown via atomic layer deposition on Mo electrodes
2014.12
원저자: Yeon Woo Yoo | American Chemical Society