Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials
2013.12
원저자: Sang Woon Lee | Elsevier
Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature
2013.06
원저자: Min Hyuk Park | AIP
Effect of forming gas annealing on the ferroelectric properties of Hf0.5Zr0.5O2 thin films with and without Pt electrodes
2013.03
Growth of conductive SrRuO3 films by combining atomic layer deposited SrO and chemical vapor deposited RuO2 layers
2012.12
원저자: Jeong Hwan Han | American Chemical Society
Impact of Bimetal Electrodes on Dielectric Properties of TiO2 and Al-Doped TiO2 Films
2012.08
원저자: Seong Keun Kim | American Chemical Society