Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-doped TiO2 Film
2014.11
원저자: Woojin Jeon | American Chemical Society
Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes
2014.08
원저자: Min Hyuk Park | AIP Publishing
Controlling the Al-Doping Profile and Accompanying Electrical Properties of Rutile-Phased TiO2 Thin Films
2014.05
Nanoscale Characterization of TiO2 Films Grown by Atomic Layer Deposition on RuO2 Electrodes
2014.02
원저자: Katsuhisa Murakami | American Chemical Society
Chemistry of active oxygen in RuO x and its influence on the atomic layer deposition of TiO 2 films
2014
원저자: Woojin Jeon | Royal Society of Chemistry