발행물

전체 논문

235

1

Etch characteristics of cobalt thin films using high density plasma of CH3COCH3/Ar gas mixture
백금빈, 오경호, 정지원
MICROELECTRONIC ENGINEERING, 202408

2

Etch characteristics of cobalt thin films using high density plasma of halogen gas
오경호, 백금빈, 정지원
THIN SOLID FILMS, 202405

3

Fine-line formation of cobalt thin films via cyclic etching using two-step process
김선재, 정준원, 오경호, 백금빈, 정지원
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 202403

4

Two-Step Cyclic Etching of Copper Thin Films Using Acetylacetone/O2 Gases
김승현, 임은택, 박성용, 정지원
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 202308

5

High-density plasma etching of cobalt thin films using C2H5OH/O2/Ar gas mixture
김선재, 정준원, 박성용, 정지원
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 202304

6

Effect of the addition of O2 on copper etching using high density plasma of acetylacetonate/Ar
정지원, 김승현, 박성용, 임은택
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 202209

7

Nanometer-scale etching of copper thin films in high-density plasma of an ethylenediamine/acetic acid/argon gas mixture
임은택, 박성용, 이지수, 김승현, 정지원
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 202201

8

Pulse-Modulated Plasma Etching of Copper Thin Films via CH3COOH/Ar
류진수, 임은택, 차문환, 정지원
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 202111

9

Etch Characteristics of Copper Thin Films in Inductively Coupled Plasma of Piperidine/Ethanol/Ar Gas Mixture
임은택, 이지수, 박성용, 정지원
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 202105

10

Inductively coupled plasma reactive ion etching of copper thin films using ethylenediamine/butanol/Ar plasma
차문환, 임은택, 박성용, 이지수, 정지원
VACUUM, 202011