정지원 교수 연구실
연구실 정보 수정하기
홈
기본 정보
연구 영역
프로젝트
발행물
구성원
발행물
논문
컨퍼런스
전체 논문
235
필터 설정하기
11
Etch Characteristics of Nanoscale Patterned Magnetic Tunnel Junction Stacks Using Pulse-Modulated Radio Frequency Source Plasma
이재용, 임은택, 류진수, 최재상, 정지원
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 202008
12
Cyclic etching of copper thin films using HBr and Ar gases
임은택, 차문환, 박성용, 이지수, 정지원
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 202007
13
Evolution of etch profile of copper thin films in high density plasmas of alcohol-based gases
임은택, 류진수, 최재상, 정지원
VACUUM, 201909
14
Etch Characteristics of Micrometer-Scale Masked Cu Thin Films Using Inductively Coupled Plasma of H-2/Ar
최재상, 조두현, 임은택, 정지원
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 201905
15
Dry etching of copper thin films in high density plasma of CH3COOH/Ar
류진수, 임은택, 최재상, 정지원
THIN SOLID FILMS, 201902
16
Etch characteristics of copper thin films in high density plasma of CH4/O-2/Ar gas mixture
임은택, 류진수, 정지원
THIN SOLID FILMS, 201809
17
Nanometer-scale etching of CoFeB thin films using pulse-modulated high density plasma
조두현, 이재용, 최재상, 정지원
CURRENT APPLIED PHYSICS, 201809
18
Influence of C2F6 Addition to Cl-2/Ar Gas on Nanometer-Scale Etch Characteristics of TiN Thin Films Using Inductively Coupled Plasma
최재상, 조두현, 임은택, 정지원
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 201806
19
Investigation on etching characteristics of Pd thin films using CH3COOH/Ar gas
이재용, 황수민, 최재상, 조두현, 정지원
THIN SOLID FILMS, 201709
20
Dry etching of palladium thin films in high density plasmas of CH3OH/Ar, C2H5OH/Ar, CH4/Ar, and CH4/O-2/Ar gas mixtures
이재용, 최재상, 조두현, 황수민, 정지원
THIN SOLID FILMS, 201709
1
2
3
4
5
6
7
8
9
10