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Dry etching of Co2MnSi magnetic thin films using a CH3OH/Ar based inductively coupled plasma
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Influence of post-treatment on properties of Cu(In,Ga)Se-2 thin films deposited by RF magnetron sputtering using a quaternary single target for photovoltaic devices
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Etch characteristics of MgO thin films in Cl2/Ar, CH3OH/Ar and CH4/Ar plasmas
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Characteristics of CdS thin films deposited on glass and Cu(In,Ga) Se-2 layer using chemical bath deposition
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THIN SOLID FILMS, 201311
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Inductively Coupled Plasma Reactive Ion Etching of Magnetic Tunnel Junction Stacks Using H2O/CH4 Mixture
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THIN SOLID FILMS, 201311
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Structural and electrical properties of radio frequency magnetron sputtered Cu(InxGa1-x)Se2 thin films with additional post-heat treatment
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THIN SOLID FILMS, 201311
38
Etch characteristics of CoFeB magnetic thin films using high density plasma of a H2O/CH4/Ar gas mixture
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Investigation on etch characteristics of FePt thin films using a H2O/Ar plasma
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MICROELECTRONIC ENGINEERING, 201304
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Influence of O2 Gas on Etch Profile of Magnetic Tunnel Junction Stacks Etched in a CH4/O2/Ar Plasma
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ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 201212